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[Case Study of Conductive Diamond Technology] Removal of Photoresist

Realizing alternative technologies to SPM technology used in the semiconductor cleaning process!

We would like to introduce a case study on the removal of photoresist in the semiconductor cleaning process using conductive diamond technology. The removal of photoresist is a process that is repeated more than several dozen times per wafer, and until now, it has required a large amount of SPM solution, with waste liquid treatment also being a challenge. The powerful oxidizing ability of electrolytic sulfuric acid can decompose photoresist into carbon dioxide and water, and the reduced sulfuric acid can be circulated and reused as peroxymonosulfuric acid. [Case Overview] ■ Issue: Large amounts of SPM solution required, waste liquid treatment is also a challenge ■ Effect - The powerful oxidizing ability of electrolytic sulfuric acid decomposes photoresist into carbon dioxide and water - The reduced sulfuric acid can be circulated and reused as peroxymonosulfuric acid *For more details, please download the PDF or feel free to contact us.